A new generation of Silicon Drift Detectors following the polysilicon technology has been developed, designed and fabricated in a first batch. The detector chips combine excellent energy resolution when moderately cooled to -10°C with a new and easy way of mounting and bonding:
Bonding scheme of a 30 mm2 polysilcion SDD with bond pads outside the active area.
|
Type |
Active Volume |
Energy Resolution @ -10°C |
Peak-to-Background Ratio |
|
Chip Format |
Energy Resolution @ -20°C |
||
|
PS3-10-128 |
10.0 mm2 x 450 µm |
typ. 135 eV |
typ. 7.000-10.000 |
|
6 x 6 mm2 |
typ. 128 eV |
||
|
PSD-10-128 |
10.0 mm2 x 450 µm |
typ. 138 eV |
typ. 2.000-3.000 |
|
6 x 6 mm2 |
typ. 133 eV |
||
|
PSD-20-135 |
20.0 mm2 x 450 µm |
typ. 145 eV |
typ. 3.000-5.000 |
|
8 x 8 mm2 |
typ. 135 eV |
||
|
PSD-30-145 |
30.0 mm2 x 450 µm |
typ. 150 eV |
typ. 3.000-5.000 |
|
9 x 9 mm2 |
typ. 140 eV |
